Critical Dimension Correction.

临界尺寸改正。

A method for improving the critical dimension uniformity of a patterned feature on a wafer in semiconductor and mask fabrication is provided.

一种在半导体与罩幕制造中改善晶圆上的图案化特征结构的临界尺寸均匀性的方法。

Uniform etching allows for an efficient method of reducing a critical dimension of an electrically active structure by simple isotropic etch.

均匀的蚀刻允许通过简单的各向同性蚀刻来减小电活性构件的临界尺寸的有效方法。

The model was analyzed and established, then the formula of critical dimension was got, which was related to the temperature distribution of heater tip.

根据传热学建立了脉冲热压焊的焊咀温度分布模型，对该模型进行分析、计算，得到了焊咀端部温度分布是否分布均匀的临界尺寸公式。

Using CTQ (Critical to Quality, critical dimension/items check list) for critical parts to check 1st batch parts from local supplier before ramp up build.

在爬坡生产前使用关键部品的关键尺寸或条目检查表来检查本地供应商递交的第一批部品。